photoresist

A photoimaging material, generally applied as a thin film, whose local solubility properties can be altered photochemically. A subsequent development step produces an image which is useful for the fabrication of microelectronic devices (e.g. integrated circuits).
Source:
PAC, 1996, 68, 2223 (Glossary of terms used in photochemistry (IUPAC Recommendations 1996)) on page 2265